Transition Mode Reactive Sputtering by Plasma Emission Monitor Control

Plasma Emission Monitoring (PEM) is a closed loop control system for transition mode, high-rate reactive sputtering of metal oxides and nitrides. Using a Pulsed DC power supply in conjunction with Denton Vacuum’s Plasma Emission Monitor (DV-PEM), this effort reports the film uniformity and deposition rates of a typical metal oxide thin film used for optical application. Film uniformity is assessed by optical transmission, refractive index and physical thickness of the deposited metal oxide films. By developing a PEM control system, transition mode reactive sputtering has been demonstrated in a Denton platform sputtering system.