Tantalum Oxide Transition Mode Reactive Sputtering by Plasma Emission Monitor Control
Tantalum pentoxide thin film coatings are commonly used in optical applications, which require a high level of thickness uniformity and precision. Gaining better process control through a plasma emission monitor (PEM) can improve yield and deposition rates while supplying that high level of precision.
In this technical paper, you'll discover:
- How process conditions relate to deposition rates, optical film properties and thin film uniformity
- Deposition methods for tantalum pentoxide thin film coatings for optical applications
- The importance of using a PEM control system to vastly improve deposition rates
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