---
title: Tantalum Oxide Transition Mode Reactive Sputtering by Plasma Emission Monitor Control
description: Gaining better process control through a plasma emission monitor (PEM) can improve yield and deposition rates while supplying the precision needed for tantalum oxide thin films.
---

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Technical Paper

## Tantalum Oxide Transition Mode Reactive Sputtering by Plasma Emission Monitor Control

Tantalum pentoxide thin film coatings are commonly used in optical applications, which require a high level of thickness uniformity and precision. Gaining better process control through a plasma emission monitor (PEM) can improve yield and deposition rates while supplying that high level of precision.

In this technical paper, you'll discover:

- How process conditions relate to deposition rates, optical film properties and thin film uniformity
- Deposition methods for tantalum pentoxide thin film coatings for optical applications
- The importance of using a PEM control system to vastly improve deposition rates

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