Pre-Cleaning in Thin Film Physical Vapor Deposition
Pre-cleaning is often a crucial step in thin film deposition. There are a number of methods available, and each pre-clean method has its benefits. The ideal method depends on what you’re trying to remove from the substrate surface.
In this technical white paper, you will discover:
- The different methods available for pre-cleaning and their benefits
- What factors you need to consider before choosing a pre-cleaning method
- Application-specific examples of how pre-cleaning processes are performed
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