Pre-Cleaning in Thin Film Physical Vapor Deposition

Pre-cleaning is often a crucial step in thin film deposition. There are a number of methods available, and each pre-clean method has its benefits. The ideal method depends on what you’re trying to remove from the substrate surface.

In this technical white paper, you will discover:

• The different methods available for pre-cleaning and their benefits
• What factors you need to consider before choosing a pre-cleaning method
• Application-specific examples of how pre-cleaning processes are performed

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