Plasma deposition of anti-reflective coatings
Plasma-enhanced chemical vapor deposition (PECVD) was used to fabricate multilayer anti-reflective coatings (ARCs) on spherical fiber couplers. Two- and four-layer designs were applied for single- and double-band ARCs centered at 1300 nm and 1550 nm, respectively. The systems consist of SiO2 as a low index material, and SiN1.3 or TiO2 as high index materials, obtained from different precursors (SiH4, SiCl4, and TiCl4). The deposition was controlled in-situ by single wavelength (632.8 nm) reflection monitoring. The optical and mechanical performance of the lenses was evaluated and related to the deposition conditions and the film microstructure.
on spherical lenses