---
title: Performance of a Radio Frequency Plasma Ion Source Technical Paper
description: The capabilities of a plasma ion source include high productivity, low cost of ownership, and more.
---

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Technical Paper

## Performance of a Radio Frequency Plasma Ion Source

 Plasma ion source capable of:

- High productivity 
    - High ion current density over large coverage areas.
    - Suitable for high capacity planetary and domed calotte systems.
- Low cost of ownership 
    - Single grid design enables quick and easy maintenance with no grid alignment.
    - No auxiliary electron source (filament or hollow cathode) required for discharge or neutralization.
    - Long production campaigns with no maintenance required.
- Deposited films exhibit low absorption and scattering losses. 
    - Independent control of ion beam current density and ion energy to enable optimization of process conditions to a wide range of optical films materials.

### Download the Technical Paper

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