Ion Bombardment Characteristics During Growth of Optical Films Using a Cold Cathode Ion Source
Ion bombardment is very important in the growth of films and modification of surfaces; it leads to re-sputtering, knock-in effects, sub-plantation, breakage of chemical bonds in polymers, etc. At Denton, we have been interested in the analysis and control of ion bombardment effects in the growth of thin films.
In this study, we examine:
- the energy and flux of impinging ions and evaluated them in the context of ion-assisted deposition of optical films and ion-induced modification of polymer surfaces for improved adhesion
- and how they performed in a vacuum system equipped with a broad beam cold cathode ion source
Film characteristics as a function of total ion energy per deposited molecule.