The Effects of Pumping Speed on the Operation of a Cold Cathode Ion Source
A cold cathode ion source is a differentially pumped device with one end of the plasma chamber open to the vacuum environment of the coating system. The pumping speed of the chambers is the major factor not directly controllable that affects the quality of the films that can be made using the ion source.
In this study we will present:
- data on the operational parameters of a cold cathode ion source at different pumping speeds
- subsequent effect on the optical properties of TiO2 films