Characterization of a Plasma Ion Source and of Ion Assisted Deposited Optical Thin Films

Abstract

It is well known that IAD (ion assisted deposition) using a plasma source improves the optical and physical characteristics of optical thin films. There are many types of plasma sources. The broad beam CC-105 “cold cathode” plasma source is a small versatile ion source that is easily retrofitted into existing deposition chambers or new installations. This paper discusses characterization of the ion produced by the plasma source and the properties of thin films produced using the plasma source for IAD (ion assisted deposition).

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