Technical Paper:
Performance of a Radio Frequency Plasma Ion Source

Plasma ion source capable of:
  • High productivity
    • High ion current density over large coverage areas.
    • Suitable for high capacity planetary and domed calotte systems.
  • Low cost of ownership
    • Single grid design enables quick and easy maintenance with no grid alignment.
    • No auxiliary electron source (filament or hollow cathode) required for discharge or neutralization.
    • Long production campaigns with no maintenance required.
  • Deposited films exhibit low absorption and scattering losses.
    • Independent control of ion beam current density and ion energy to enable optimization of process conditions to a wide range of optical films materials.