Bipolar Pulsed DC Sputtering of Optical Films

Bipolar pulsed DC sputtering is a new technique for high rate reactive deposition of dielectric oxides on diverse types of substrates. This effort reports on the application of Bipolar pulsed DC sputtering to generate single layer and multilayer oxide coatings on flat, curved, glass and plastic substrate surfaces. The optical (refractive index and extinction coefficient) and physical (durability and moisture stability) properties of Ta2 O5 TiO2 , ZrO2 , Nb2 O5 , WO4 , Al2 O3 and SiO 2 films and film stacks are presented.